Dear 2020 China ALD Participants,
You are welcome to submit the full papers in 2020 China ALD to a special issue "The 5th International Conference on ALD Applications & 1st Asian ALD Conference (2020 China ALD) " on Nanoscale Research Letters.(2018 impact factor: 3.125, https://nanoscalereslett.springeropen.com/aald)
Papers will be reviewed according to criteria set by Nanoscale Research Letters and must meet Nanoscale Research Letters' standards for both technical content and written English. All manuscripts are reviewed to the same standards as regular submissions. In preparing your article, you should follow the submission guidelines. Note that acceptance to present at the conference does not guarantee the acceptance of the manuscript.
Please submit your manuscripts using the journals' online manuscript submission system:
It is very IMPORTANT that authors indicate to which Thematic Series (Shown in below) the paper is submitted. The options should show up during the 'Additional Information' section of the questionnaire. Please make sure you choose "Applications of Atomic Layer Deposition ".
If you have already started a submission without finding this Thematic series, please remove the old submission and begin a new submission. The problem should be solved.
Manuscript submission deadline: Dec. 31, 2020.
Please observe the deadline to allow for timely processing.